Electrostatic Attraction of particles in Equipment and Environment of a LTPS TFT-LCD Manufacturing Process

摘要

This paper aims to investigate the electrostatic charge and attraction of particles in a LTPS TFT-LCD manufacturing process. By measuring the ESC and particles inside and around a stepper we can find out the ESC and PSA phenomena in the stepper process. From the results we can see, ion emitter can decline the overall ESC problem in the stepper process but generate high ESC problem in the region near the ion emitter inside the stepper. The behavior of electrostatic attraction of particles is very similar to the ESC situations. This result imply that the ion emitter is necessary for overall ESD and ESA control, but inside the stepper the cleanness must be careful maintained to diminish the ESA effect.