首页> 外文会议>2019 1st IEEE International Conference on Sustainable Energy Technologies and Systems >Impact of Gallium Nitride Semiconductor Devices in Tri-state Boost Converter
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Impact of Gallium Nitride Semiconductor Devices in Tri-state Boost Converter

机译:氮化镓半导体器件对三态升压转换器的影响

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Gallium Nitride (GaN) semiconductor power devices are one of the developing innovations that have shown a tremendous advantage over silicon and silicon carbide devices. GaN devices empower the power converter in terms of various performance parameters like efficiency, fast response, and compactness in sizing. In this work, the modeling of Tri-state boost converter (TSBC) using three sets of semiconductor devices i.e. (i) Si-Diode and Si-MOSFET, (ii) SiC-Diode and SiC-MOSFET, and (iii) GaN-Diode and GaN-MOSFET have performed. Thereafter, the losses of each versions of TSBC are analyzed and presented through loss matrix. Further, comparative results are plotted which show that the GaN based TSBC consumes very low losses among all three versions of TSBC for high frequency applications, which confirms the greatness of GaN semiconductor devices.
机译:氮化镓(GaN)半导体功率器件是发展中的创新之一,与硅和碳化硅器件相比,它们已显示出巨大的优势。 GaN器件可为功率转换器提供各种性能参数,例如效率,快速响应和尺寸紧凑。在这项工作中,使用三组半导体器件对三态升压转换器(TSBC)进行建模,即(i)Si二极管和Si-MOSFET,(ii)SiC二极管和SiC-MOSFET以及(iii)GaN-二极管和GaN-MOSFET均已完成。此后,分析每个TSBC版本的损失并通过损失矩阵表示。此外,绘制的比较结果表明,在用于高频应用的所有三种TSBC版本中,基于GaN的TSBC损耗非常低,这证实了GaN半导体器件的巨大优势。

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