Modeling and Simulation of the Maximum Velocity Inner the Centrifugal Molecular Distiller: Application of Factorial Design and Surface Response Methodology

摘要

The characterization of the evaporating liquid film, well distributed on the inner wall ofrnthe evaporator surface, is of paramount importance in the centrifugal molecularrndistillation (CMD) process. This study provides a comprehensive analysis on thernmaximum velocity in radial direction (Vel_(max)) in the liquid film (LF) flowing over thernevaporator surface of a centrifugal molecular distiller. The mathematical modelrncomprises continuity and velocity profile equations. The theoretical study is illustratedrnfor a heavy petroleum fraction. In this work, factorial design and response surface werernused to simulate and to investigate the influence of the operating conditions (feed flowrnrate (Q), evaporator temperature (EVT), system pressure (Ps) and rotor speed (RS)) andrnof the geometrical parameters (half angle of the rotating cone (β’) and radial distancern(RD)) on the Vel_(max) variable. The results indicated that, at 90% confidence interval, β’rnequals 70° and P_s equals 0.1 Pa were in good performance with the CMD process.rnTherefore, the EVT, Q, RS and RD were statistically significant variables and must bernkept from 400 to 560 K from 1.5 to 2.5 kg.h~(-1) and from 580 to 1200 rpm, respectively.