首页> 外文会议>14th Asian-Pacific Corrosion Control Conference: Abstracts >IMPROVING THE FORMATION AND PROTECTIVE PROPERTIESOF SILANE FILMS BY THE COMBINED USEOF ELECTRODEPOSITION ANDNANOPARTICLES INCORPORATION
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IMPROVING THE FORMATION AND PROTECTIVE PROPERTIESOF SILANE FILMS BY THE COMBINED USEOF ELECTRODEPOSITION ANDNANOPARTICLES INCORPORATION

机译:通过电沉积和纳米颗粒结合使用改善硅烷膜的形成和保护性能

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摘要

Silane coupling agents could improve the adhesion and protective properties of paints andrnorganic coatings on metals, and have been widely applied as an environmental compliant anti-corrosivernpretreatment of metals, aiming to alternating highly toxic chromating process. Recently, a novel technique,rnnamely electrodeposition, has been used to prepare silane films. Investigations indicated that thernelectrodeposited silane films performed higher corrosion resistance. Almost at the same time, it has beenrnreported that silica nanoparticles incorporations could also enhance the protectiveness of silane films. Inrnthis paper, these two novel techniques were used together to prepare protective organic-inorganicrnlong-chained dodecyltrimethoxysilane (DTMS)/SiO2 composite films on aluminum substrates. The resultsrnshowed that both the two techniques can improve the films formation and thereby their protectiveness. Therninfluences of the deposition potential and the silica content were investigated by electrochemicalrnimpedance spectroscopy (EIS) and scanning electron microscopy (SEM). As the deposition potential shiftsrnnegative or the silica content in the silane solution increases, the corrosion resistance of the prepared filmrnfirst increases to a certain value and then decreases. “Critical conditions”,I.e. a “critical depositionrnpotential” and a “critical silica content” were observed, respectively, under which the prepared silane filmsrnhad the highest corrosion resistance. The enhancement in film thickness has been detected in the case ofrnSiO2 incorporation and (or) cathodic electrodeposition from the depth profiles of the relevant atoms ofrnsilane films as measured by secondary-ion mass spectroscopy (SIMS), probably suggesting that the silicarnparticles participate in the film deposition.
机译:硅烷偶联剂可改善金属上的涂料和有机涂料的附着力和防护性能,并已广泛用作对环境友好的金属防腐处理,旨在交替使用高毒性的铬酸盐处理工艺。最近,一种新的技术,即电沉积,已被用于制备硅烷膜。研究表明,电沉积硅烷膜具有较高的耐腐蚀性。几乎同时,据报道,掺入二氧化硅纳米粒子也可以增强硅烷膜的保护性。在本文中,将这两种新技术一起用于在铝基板上制备有机-无机长链十二烷基三甲氧基硅烷(DTMS)/ SiO2复合保护膜。结果表明,两种技术均可改善成膜性,从而提高其保护性。通过电化学阻抗谱(EIS)和扫描电子显微镜(SEM)研究了沉积电位和二氧化硅含量的影响。随着沉积电位的负迁移或硅烷溶液中二氧化硅含量的增加,制得的膜的耐蚀性首先增加至一定值,然后降低。 “关键条件”,即分别观察到“临界沉积电势”和“临界二氧化硅含量”,在此下制备的硅烷膜具有最高的耐腐蚀性。根据二次离子质谱(SIMS)的测量,从rn硅烷膜相关原子的深度分布中检测到rnSiO2掺入和/或进行阴极电沉积时,可以检测到膜厚度的增加,这可能表明二氧化硅颗粒参与了该膜的形成。沉积。

著录项

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  • 会议地点 Shanghai(CN)
  • 作者单位

    Department of Chemistry, Zhejiang University, Hangzhou, 310027, China;

    Department of Chemistry, Zhejiang University, Hangzhou, 310027, China;

    Department of Chemistry, Zhejiang University, Hangzhou, 310027, China;

    Department of Chemistry, Zhejiang University, Hangzhou, 310027, China;

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