首页> 外文会议>10th EMAS regional workshop on electron probe microanalysis of materials today : Practical aspects >RESEARCH OF STRUCTURE AND ELEMENT COMPOSITION AFTER LASER RADIATION ON GAP EPITAXIAL DIODE STRUCTURES
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RESEARCH OF STRUCTURE AND ELEMENT COMPOSITION AFTER LASER RADIATION ON GAP EPITAXIAL DIODE STRUCTURES

机译:间隙表观二极管结构激光辐照后结构和元素组成的研究

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The research of epitaxial layers reconstruction of heterostructure semiconductor surface layers has fundamental value for studying of boundary characteristics with different lattice parameters and an element composition. The influence of radiation of the laser on volt-ampere characteristics and the internal quantum yield of GaP:Zn,O heterostructure electro-photoluminescence is investigated by combination of probe methods as X-ray diffraction in standing wave mode (XSW), Auger electron spectroscopy (AES), low electron energy diffraction (LEED), low energy ion scattering (LEIS), and secondary ion mass spectroscopy (SMS). The diode structure had continuous ohmic contacts on the part of p- and n-conductivity zones. The laser processing was carried out from the crystal surface, which was perpendicular to the p-n transition plane. The optical influence on a photodiode structure active zone was made by scanning of a laser beam by a diameter ~ 60 μm with speed 4 cm.s~(-1) with on their photoluminescence surface. The laser worked in a pulse mode on frequency 10.2 kHz at duration of a pulse of radiation ~ 0.3 ms and density of power flow ~ 10~6 W.cm~(-2). The scanning was carried out for one pass with 10 μm step. The results of influence at supercritical power flow laser radiation (more than 10~7 W.cm~(-2)) the strong decrease of a quantum yield luminescence and the growth of leakage currents were observed. The laser on alumino-yttrium garnet radiated on length of λ = 1.06 μm wave (it corresponds to energy photon as 1.17 eV), which is twice less than width of the GaP forbidden zone with same diode structures were carried out with test short-term current by duration 12 hours at density of a current 11 A.cm~(-2) and effective temperature of p-n transition at 115 ℃. It is supposed that the powerful optical irradiation, exciting an impurity atom's electronic subsystem, promotes course quasi-chemical reactions. The reasons of the changes of the element composition and lattice structure in an active zone of LED doping by zinc and oxygen on base the data of the indicated above methods are discussed.
机译:异质结构半导体表面层外延层重构的研究对于研究具有不同晶格参数和元素组成的边界特征具有基础价值。通过驻波模式下的X射线衍射,俄歇电子能谱等探测方法的组合,研究了激光辐射对GaP:Zn,O异质结构电致发光的伏安特性和内部量子产率的影响。 (AES),低电子能量衍射(LEED),低能离子散射(LEIS)和二次离子质谱(SMS)。二极管结构在p和n导电区域的一部分上具有连续的欧姆接触。从垂直于p-n过渡平面的晶体表面进行激光加工。通过在光致发光表面上以4 cm.s〜(-1)的速度扫描直径约60μm的激光束,从而对光电二极管结构有源区产生光学影响。激光以脉冲模式工作,频率为10.2 kHz,辐射脉冲持续时间〜0.3 ms,功率流密度〜10〜6 W.cm〜(-2)。以10μm的步长进行扫描一次。在超临界功率流激光辐射(大于10〜7 W.cm〜(-2))影响下,观察到量子产率发光的强烈下降和漏电流的增长。用短时测试法对铝-钇石榴石上的激光器发出了波长为λ= 1.06μm的波(对应于能量光子为1.17 eV),该波长比具有相同二极管结构的GaP禁区的宽度小两倍。电流持续时间为12小时,电流密度为11 A.cm〜(-2),有效转变温度为115℃。据推测,强大的光辐射激发了杂质原子的电子子系统,促进了过程准化学反应。基于上述方法的数据,讨论了锌和氧掺杂LED有源区中元素组成和晶格结构变化的原因。

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