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Effect of catalyst shape and etchant composition on etching direction in metal-assisted chemical etching of silicon to fabricate 3D nanostructures

机译:催化剂形状和蚀刻剂组成对硅金属辅助化学刻蚀制造3D纳米结构中刻蚀方向的影响

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摘要

Metal-assisted chemical etching (MaCE) of silicon in conjunction with shaped catalysts was used to fabricate 3D nanostructures such as sloping channels, cycloids, and spirals along with traditional vertical channels. The investigation used silver nanorods, nanodonuts along with electron beam lithography (EBL)-patterned gold nanodiscs, nanolines, squares, grids, and star-shaped catalysts to show how catalyst shape and line width directly influence etching direction. Feature sizes ranging from micrometers down to 25 nm were achieved with aspect ratios of at least 10:1 and wall roughness of 10 nm or less. This research demonstrates the potential of MaCE as a new, maskless nanofabrication technology.
机译:硅的金属辅助化学蚀刻(MaCE)与成型催化剂一起用于制造3D纳米结构,例如倾斜通道,摆线和螺旋线以及传统的垂直通道。该研究使用了银纳米棒,纳米颗粒以及电子束光刻(EBL)图案的金纳米盘,纳米线,正方形,网格和星形催化剂,以显示催化剂形状和线宽如何直接影响蚀刻方向。使用至少10:1的纵横比和10 nm或更小的壁粗糙度,可以实现从微米到25 nm的特征尺寸。这项研究证明了MaCE作为一种新的无掩模纳米加工技术的潜力。

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