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Subnanometer resolution displacement sensor based on a grating interferometric cavity with intensity compensation and phase modulation

机译:基于带强度补偿和相位调制的光栅干涉腔的亚纳米分辨率位移传感器

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A subnanometer resolution displacement sensor based on a grating interferometric cavity with intensity compensation and phase modulation is proposed and experimentally demonstrated in this paper. The grating interferometric cavity is composed of a frequency-stabilized laser source, a diffraction grating, and a mirror. To realize a subnanometer resolution, the intensity compensation and phase modulation technique are introduced, which are achieved by an intensity compensation light path, three closed placed photodetectors, a processing circuit and a piezoelectric ceramic transducer, and a lock-in amplifier. The intensity compensation technique can improve the stability of the output intensity signal greatly while the phase modulation technique can increase the signal-to-noise ratio dramatically. The detected signal is intensity modulated and processed by a particular arithmetic circuit. Experimental results indicate that the sensitivity of this displacement sensor is 44.75 mVm and the highest resolution can reach 0.017 nm, which is 27 times better than the one without intensity compensation and phase modulation. As a high-performance sensor with immunity to electromagnetic interference, this displacement sensor has potential to be used in nanoscience and technology. (C) 2015 Optical Society of America
机译:提出了一种基于光栅干涉腔并具有强度补偿和相位调制的亚纳米分辨率位移传感器,并进行了实验验证。光栅干涉腔由稳频激光源,衍射光栅和反射镜组成。为了实现亚纳米级分辨率,引入了强度补偿和相位调制技术,该技术通过强度补偿光路,三个封闭式光电探测器,处理电路和压电陶瓷换能器以及锁定放大器来实现。强度补偿技术可以大大提高输出强度信号的稳定性,而相位调制技术可以显着提高信噪比。所检测的信号被特定的运算电路进行强度调制和处理。实验结果表明,该位移传感器的灵敏度为44.75 mV / nm,最高分辨率可达0.017 nm,比没有强度补偿和相位调制的传感器高27倍。作为一种抗电磁干扰的高性能传感器,这种位移传感器具有在纳米科学和技术中使用的潜力。 (C)2015年美国眼镜学会

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