首页> 外国专利> METHOD FOR MANUFACTURING REFINED ORTHO-PERIODIC ACID AQUEOUS SOLUTION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ORTHO-PERIODIC ACID AQUEOUS SOLUTION

METHOD FOR MANUFACTURING REFINED ORTHO-PERIODIC ACID AQUEOUS SOLUTION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ORTHO-PERIODIC ACID AQUEOUS SOLUTION

机译:方法生产精制ORTHO-PERIODIC酸水溶液,制造的方法半导体器件,ORTHO-PERIODIC酸水溶液

摘要

PROBLEM TO BE SOLVED: To provide: a method for manufacturing a refined ortho-periodic acid aqueous solution reduced in Cr(chromium) content; a method for manufacturing a semiconductor device, which comprises an etching step of etching a Ru layer formed on a semiconductor substrate with an etchant obtained according to the manufacturing method; and an ortho-periodic acid aqueous solution reduced in Cr content.;SOLUTION: A method for manufacturing a refined ortho-periodic acid aqueous solution comprises: a metal-removing step of bringing a crude ortho-periodic acid aqueous solution containing ortho-periodic acid and water, provided that the content of the ortho-periodic acid is 15 mass% or less to a total mass and 1 mass ppb or more of Cr is included, into contact with a metal-removing agent containing a chelate resin.;SELECTED DRAWING: None
机译:

著录项

  • 公开/公告号JP2022099242A

    专利类型

  • 公开/公告日2022-07-04

    原文格式PDF

  • 申请/专利权人 TOKYO OHKA KOGYO CO LTD;

    申请/专利号JP20210167645

  • 发明设计人 ITO YO;WADA YUKIHISA;

    申请日2021-10-12

  • 分类号H01L21/306;C23G1/10;

  • 国家

  • 入库时间 2023-06-25 23:57:36

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