首页> 外国专利> MULTI-SCALE-FACTOR IMAGE SUPER RESOLUTION WITH MICRO-STRUCTURED MASKS

MULTI-SCALE-FACTOR IMAGE SUPER RESOLUTION WITH MICRO-STRUCTURED MASKS

机译:MULTI-SCALE-FACTOR图像超分辨率微观结构的面具

摘要

There is included a method and apparatus comprising computer code configured to cause a processor or processors to perform obtaining an input low resolution (LR) image comprising a height, a width, and a number of channels, implementing a feature learning deep neural network (DNN) configured to compute a feature tensor based on the input LR image, generating, by an upscaling DNN, a high resolution (HR) image, having a higher resolution than the input LR image, based on the feature tensor computed by the feature learning DNN, wherein a networking structure of the upscaling DNN differs depending on different scale factors, and wherein a networking structure of the feature learning DNN is a same structure for each of the different scale factors.
机译:

著录项

  • 公开/公告号EP4018411A1

    专利类型

  • 公开/公告日2022-06-29

    原文格式PDF

  • 申请/专利权人 TENCENT AMERICA LLC;

    申请/专利号EP20210856403

  • 发明设计人 JIANG WEI;WANG WEI;LIU SHAN;

    申请日2021-07-12

  • 分类号G06T1/20;G06T3/40;G06T7/60;G06T7/90;G06N3/02;G06N3/04;G06N3/06;G06N3/08;

  • 国家

  • 入库时间 2023-06-25 23:54:17

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