A micro-space three-dimensional morphology measurement apparatus comprising a light source assembly and at least two detection assemblies, wherein the detection assemblies comprise substrates (8, 11), insulating layers (7, 12) are fixedly provided on the substrates (8, 11), a plurality of silicon wires (1, 2, 13) that are mutually parallel and have a same size and shape are arranged on the insulating layers (7, 12), and the distance between adjacent silicon wires (1, 2, 13) is the same, two ends of each silicon wire (1, 2, 13) both lead out wires (3, 4) and are connected to electrical potential measurement meters (5, 6), and the electrical potential measurement meters (5, 6) are connected to processors; the light source assembly performs line-by-line scanning on a surface of a measured sample (14) by means of laser light, and when laser light reflected by the measured sample (14) shines onto the detection assemblies, a near-field coupling effect occurs between the silicon wires (1, 2, 13) and the substrates (8, 11), and causes an amplitude of a resonator formed by the silicon wires (1, 2, 13) and the substrates (8, 11) to produce to be completely suppressed, and the processors calculate position information of a reflection point of the surface of the measured sample (14) according to continuous signals output by the electrical potential measurement meters (5, 6) connected to the silicon wires (1, 2, 13).
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