An electron gun, an electron beam application device, a method for confirming an emission axis of an electron beam emitted from a photocathode, and a method for aligning an emission axis of an electron beam emitted from a photocathode

摘要

An object of the present invention is to provide an electron gun capable of confirming the presence or absence of deviation of an electron beam emitted from a photocathode from a design emission central axis. An electron gun comprising: a light source; a photocathode that emits an electron beam in response to light received from the light source; An electron beam shielding member that can be used, a measuring unit measuring the intensity of an electron beam shielded by the electron beam shielding member, and disposed between the anode and the electron beam shielding member, wherein the electron beam passing through the anode is measured by the electron beam shielding member an electron beam emission direction deflection device for changing a position when reaching Thus, when an electric field is formed between the photocathode and the anode, the problem can be solved by the electron gun in which the drift space in which the influence of the electric field can be neglected is formed.