首页> 外国专利> Organic metal compounds, thin film vapor deposition compositions containing organic metal compounds, thin film manufacturing methods using thin film vapor deposition compositions, thin films manufactured from thin film vapor deposition compositions, and semiconductor elements containing thin films.

Organic metal compounds, thin film vapor deposition compositions containing organic metal compounds, thin film manufacturing methods using thin film vapor deposition compositions, thin films manufactured from thin film vapor deposition compositions, and semiconductor elements containing thin films.

机译:有机金属化合物,含有有机金属化合物的薄膜气相沉积组合物,使用薄膜气相沉积组合物的薄膜制造方法,由薄膜气相沉积组合物制造的薄膜,以及含有薄膜的半导体元件。

摘要

To provide a semiconductor device capable of easily producing a semiconductor thin film using a organic metallic compound and having high reliability in electrical characteristics by including the produced thin film.SOLUTION: An organic metallic compound is represented by a chemical formula 1. In the chemical Formula 1, M is Sr or Ba, and A is derived from a compound represented by a chemical formula containing a predetermined alkyl group.SELECTED DRAWING: None
机译:本发明提供一种半导体器件,其能够使用有机金属化合物容易地制备半导体薄膜,并且通过包括所制备的薄膜而在电特性上具有高可靠性。溶液:有机金属化合物由化学式1表示。在化学式1中,M为Sr或Ba,A衍生自由包含预定烷基的化学式表示的化合物。所选图形:无

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