High-Current Ion Implanters and Methods for Controlling Ion Beams Using High-Current Ion Implanters

摘要

Approaches for increasing the operating range of an electrostatic lens are provided herein. An electrostatic lens of the ion implantation system may receive an ion beam from an ion source, the electrostatic lens disposed along a second side of the ion beam line and a first plurality of conductive beam optics disposed along one side of the ion beam line and a second plurality of conductive beam optics. The ion implantation system may further include a power supply in communication with the electrostatic lens, the power supply operable to supply a voltage and a current to at least one of the first and second plurality of conductive beam optics, wherein A voltage and current deflect an ion beam at a beam deflection angle, where the ion beam is accelerated within an electrostatic lens and then decelerated.