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TEMPERATURE DISTRIBUTION EVALUATION METHOD, TEMPERATURE DISTRIBUTION EVALUATION DEVICE, AND SOAKING RANGE EVALUATION METHOD

机译:温度分布评价方法,温度分布评估装置和浸泡范围评价方法

摘要

To provide a new temperature distribution evaluation method, a temperature distribution evaluation device, and a soaking range evaluation method, as the temperature distribution evaluation method which evaluates a temperature distribution of a heating area 40A provided in a heating device 40, the present invention is a temperature distribution evaluation method which, in the heating area 40A, heats a semiconductor substrate 10 and a transmitting and receiving body 20 for transporting a raw material to and from the semiconductor substrate 10, and evaluates a temperature distribution of the heating area 40A on the basis of a substrate thickness variation amount A of the semiconductor substrate 10. Accordingly, temperature distribution evaluation can be implemented for a high temperature area at 1600 - 2200°C or the like at which it is hard to evaluate the temperature distribution due to the limit of a thermocouple material.
机译:为了提供一种新的温度分布评估方法,温度分布评估装置和浸泡范围评估方法,作为评估在加热装置40中设置的加热区域40a的温度分布的温度分布评估方法,本发明是一种 温度分布评估方法在加热区域40a中加热半导体衬底10和传输和接收体20,用于从半导体衬底10输送原料,并根据基础评估加热区域40a的温度分布 在半导体衬底10的基板厚度变化量A的内容中,可以在1600-2200℃的高温面积处实现温度分布评估,在此期间难以评估由于限制引起的温度分布 热电偶材料。

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