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Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
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机译:涂层制品,包括超快速激光处理的银色包装层,低发射率薄膜涂层,和/或制造相同的方法
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摘要
Certain example embodiments relate to ultra-fast laser treatment of silver-inclusive (low-emissivity) low-E coatings, coated articles including such coatings, and/or associated methods. The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating including at least one sputter-deposited silver-based layer, and with each said silver-based layer being sandwiched between one or more dielectric layers. The low-E coating is exposed to laser pulses having a duration of no more than 10−12 seconds, a wavelength of 355-500 nm, and an energy density of more than 30 kW/cm2. The exposing is performed so as to avoid increasing temperature of the low-E coating to more than 300 degrees C. while also reducing (a) grain boundaries with respect to, and vacancies in, each said silver-based layer, (b) each said silver-based layer's refractive index, and (c) emissivity of the low-E coating compared to its as-deposited form.
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机译:某些示例实施例涉及银覆层(低发射率)低E涂层的超快速激光处理,包括这种涂层的涂覆制品和/或相关方法。 低E涂层形成在基材(例如,硼硅酸盐或钠钙石灰玻璃)上,其中低E涂层包括至少一个溅射沉积的银基层,并且每个所述银基层夹在 一个或多个介电层。 低E涂层暴露于持续时间不超过10-12秒的激光脉冲,波长为355-500nm,能量密度大于30kW / cm 2。 进行曝光以避免将低E涂层的温度升高到300多变的时间。同时还减少了(a)相对于和空位的晶界,每个所述银基层(b) 与其沉积形式相比,所述银基层的折射率和(c)低E涂层的发射率。
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