- - / COATED ARTICLE INCLUDING ULTRA-FAST LASER TREATED SILVER-INCLUSIVE LAYER IN LOW-EMISSIVITY THIN FILM COATING AND/OR METHOD OF MAKING THE SAME

摘要

Certain exemplary embodiments of the present invention relate to ultrafast laser processing of silver-comprising (low emissivity) low-E coatings, coated articles comprising such coatings, and/or related methods. The low-e coating is formed on a substrate (eg, borosilicate glass or soda-lime silica glass), wherein the low-e coating comprises at least one sputter-deposited silver-based layer, each silver-based layer comprising: interposed between one or more dielectric layers. The low-e coating is exposed to a laser pulse having a duration of 10 -12 seconds or less, a wavelength of 355 to 500 nm, and an energy density greater than 30 kW/cm 2 . The exposure avoids increasing the temperature of the low-e coating above 300° C. while also avoiding (a) grain boundaries for each of the silver-based layers, and vacancy within each of the silver-based layers. and (b) reducing the refractive index of each of the silver-based layers, and (c) reducing the emissivity of the low-e coating as compared to the as-deposited form of the low-e coating.