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STACKED THERMAL PROCESSING CHAMBER MODULES FOR REMOTE RADIATIVE HEATING IN SEMICONDUCTOR DEVICE MANUFACTURE
STACKED THERMAL PROCESSING CHAMBER MODULES FOR REMOTE RADIATIVE HEATING IN SEMICONDUCTOR DEVICE MANUFACTURE
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机译:用于半导体器件制造中的远程辐射加热的堆叠热处理室模块
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摘要
Stacked thermal process chamber module for remote radiative heating of semiconductor device workpieces. A stacked thermal process module may include a stack of thermal process chambers and one or more generators of electromagnetic radiation. The electromagnetic radiation may be transported from a generator remote from the process chambers through one or more waveguides, thereby minimizing the volume and/or cleanroom footprint of the stacked thermal process chamber module. A waveguide may terminate in a process chamber so that electromagnetic radiation delivered during a thermal process may be coupled into one or more materials of the workpiece. The radiative heating process may overcome many of the limitations of thermal process chambers that instead employ a local heat source located within a process chamber.
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