MOLYBDENUM OXIDE SPUTTERING TARGET AND MOLYBDENUM OXIDE SPUTTERING TARGET PRODUCTION METHOD

摘要

This molybdenum oxide sputtering target comprises a MoOX phase. In the MoOX phase: a MoO2 phase and a MoO3 phase are included; the remaining portion is unavoidable impurities; the area ratio of pores is 5% or less; the average area of pores is 0.5 µm2 or less; and the average particle area of a crystalline structure is 5 µm2 or less.