首页> 外国专利> COMPOSITION, CURED FILM, COLOR FILTER, LIGHT SHIELDING FILM, OPTICAL ELEMENT, SOLID-STATE IMAGING ELEMENT, HEADLIGHT UNIT, MODIFIED SILICA PARTICLES, AND METHOD FOR PRODUCING MODIFIED SILICA PARTICLES

COMPOSITION, CURED FILM, COLOR FILTER, LIGHT SHIELDING FILM, OPTICAL ELEMENT, SOLID-STATE IMAGING ELEMENT, HEADLIGHT UNIT, MODIFIED SILICA PARTICLES, AND METHOD FOR PRODUCING MODIFIED SILICA PARTICLES

机译:组合物,固化膜,滤色器,遮光膜,光学元件,固态成像元件,前灯单元,改性二氧化硅颗粒和制备改性二氧化硅颗粒的方法

摘要

The present invention provides a composition having excellent development residue suppressibility. Moreover, also provided are a cured film, a color filter, a light shielding film, an optical element, a solid-state imaging element, a headlight unit, modified silica particles, and a method for producing modified silica particles. The composition according to the embodiment of the present invention contains modified silica particles and a polymerizable compound, in which the modified silica particles each contain a silica particle and a coating layer coating the silica particle, and the coating layer contains a polymer containing a repeating unit represented by General Formula (1).;
机译:本发明提供了具有优异的显影残基抑制性的组合物。 此外,还提供了固化膜,滤色膜,遮光膜,光学元件,固态成像元件,前灯单元,改性二氧化硅颗粒,以及制备改性二氧化硅颗粒的方法。 根据本发明的实施方案的组合物含有改性二氧化硅颗粒和可聚合化合物,其中改性二氧化硅颗粒各自含有二氧化硅颗粒和涂覆二氧化硅颗粒的涂层,并且涂层含有含有重复单元的聚合物 由通式(1)表示;

著录项

  • 公开/公告号US2022010121A1

    专利类型

  • 公开/公告日2022-01-13

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORPORATION;

    申请/专利号US202117485493

  • 发明设计人 RYOSUKE KATO;

    申请日2021-09-26

  • 分类号C08L33/14;C08L33/06;C08J5/18;C09C1/30;C09C3/12;F21S41/40;G02B1/04;G02B5;G02B5/20;

  • 国家 US

  • 入库时间 2022-08-24 23:21:01

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