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ULTRAVIOLET LIGHT GENERATION TARGET, METHOD FOR MANUFACTURING ULTRAVIOLET LIGHT GENERATION TARGET, AND ELECTRON-BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE
ULTRAVIOLET LIGHT GENERATION TARGET, METHOD FOR MANUFACTURING ULTRAVIOLET LIGHT GENERATION TARGET, AND ELECTRON-BEAM-EXCITED ULTRAVIOLET LIGHT SOURCE
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机译:紫外线发电靶,制造紫外光靶的方法,以及电子束激发紫外光源
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摘要
An ultraviolet light generation target includes a light emitting layer. The light emitting layer contains a YPO4 crystal to which at least scandium (Sc) is added, and receives an electron beam to generate ultraviolet light. Further, a method of manufacturing the ultraviolet light generation target includes a first step of preparing a mixture containing yttrium (Y) oxide, Sc oxide, phosphoric acid, and a liquid, a second step of evaporating the liquid, and a third step of firing the mixture.
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