DEVICE AND METHOD FOR REGULATING AND CONTROLLING INCIDENT ANGLE OF LIGHT BEAM IN LASER INTERFERENCE LITHOGRAPHY

摘要

A device and method for regulating and controlling an incident angle of a light beam in laser interference lithography. The device comprises: a beam splitter prism (11), a first decoupling lens (12), a first position detector (13) and a feedback control system (16), wherein the beam splitter prism (11) is located between a first lens (8) and a second lens (9); the first decoupling lens (12) is located between the first position detector (13) and the beam splitter prism (11); the feedback control system (16) is connected to the first position detector (13) and a first universal reflecting mirror (602); the beam splitter prism (11) is used for reflecting first incident light that passes through the first universal reflecting mirror (602); the first decoupling lens (12) is used for enabling first reflected light of the beam splitter prism (11) to be incident to the first position detector (13); the first position detector (13) is used for measuring the position of a light beam and transmitting a measurement result to the feedback control system (16); and the feedback control system (16) is used for outputting a control instruction according to the measurement result, and for adjusting a mirror base of the first universal reflecting mirror (602), thereby regulating and controlling an incident angle of an exposure light beam. The incident angle of a light beam can thus be accurately regulated and controlled.