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Manufacturing method of rare earth magnet precursor or rare earth magnet molding having rough surface structure

机译:具有粗糙表面结构的稀土磁体前体或稀土磁铁模塑的制造方法

摘要

Problem to be solved: to provide a method of producing a rare earth magnet precursor having a rough surface structure.Solution: the surface of the rare earth magnet precursor having a rough surface structure μ M(b) SZ is 50 to 1500 μ M(c) the SDR is formed with unevenness to satisfy at least one of the requirements of 0.3 toThe surface of the raw material forming body of the rare earth magnet precursor is irradiated with a pulsed wave laser beam to satisfy the requirements (I) - (V) to form a roughened structure.Manufacturing method of rare earth magnet precursor.(I) when the irradiation angle of the laser beam is 15 to 90 degrees (II) when the laser light is irradiated, the irradiation speed is 10 to 1000 mm / sec (III) when the laser beam is irradiated with the energy density of 0.1 to 50 GW / cm. Sup. 2 (IV), and the repetition frequency of the laser beam is 1 to 80 times (V) When the laser light is irradiated, the pitch interval is 0.01 to 1 mmNo selection
机译:要解决的问题:提供一种制备具有粗糙表面结构的稀土磁体前体的方法。溶液:具有粗糙表面结构μM(b)Sz的稀土磁体前体的表面为50至1500μm( c)通过不均匀的不均匀性形成SDR,以满足稀土磁体前体的原料形成体的0.3待表面的至少一个,以脉冲波激光束照射,以满足要求(i) - (v )形成粗糙的结构。稀土磁体前体的制造方法。(i)当激光束的照射角为15至90度(ii)时,当照射激光时,照射速度为10至1000mm / 秒(iii)当激光束以0.1至50 gw / cm的能量密度照射时。 sup。 在照射激光时,激光束的重复频率和激光束的重复频率为1至80倍(v),间距间隔为0.01至1 mmno选择

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