Atomic layer treatment processes using metastable active radical species

摘要

A method of treating the exposed surface of the substrate includes purging the first chamber and second chamber of the substrate processing system using purge gas.A gas distributor is disposed between the first chamber and the second chamber.The method includes letting the treatment gas flow into the second chamber without flowing into the first chamber and building the adsorption layer on the surface of the substrate disposed on the substrate support in the second chamber.The method includes stopping the flow of treatment gas into the second chamber.The method includes purging the first chamber and the second chamber through the purge gas.The method includes generating a metastable active radical species, generating a metastable active radical species, flowing the purge gas into the first chamber, delivering the metastable active radical species to the second chamber through a gas distributor and activating the adsorbed layer.Diagram