PLASMA-ASSISTED STEAM-ASSISTED CHEMICAL DEPOSIT INSTALLATION WITH INCREASED PRODUCTION CAPACITY

摘要

Plasma-assisted chemical vapor deposition installation on substrates arranged in a nacelle, comprising a deposition chamber (2), a robot (R) for loading the substrates into a nacelle and unloading the substrates from said nacelle, three nacelles ( 4.1, 4.2, 4.3), three handling arms, each movable in rotation around a vertical axis (Z) and movable in translation vertically and, each handling arm being configured to introduce a nacelle (4.1, 4.2, 4.3) in the enclosure (2) located in a drop zone (ZD) and extract it, and to place each nacelle in a storage area (ZS) and in a loading / unloading area, the drop zones, (ZD ), storage (ZS) and loading (ZC) being arranged around the axis of rotation (Z), the handling arms being configured to ensure the introduction of one of the nacelles into the enclosure (2) by a handling arm, when the other nacelle has been extracted from the enclosure (2) by the other arm of handling. Figure for the abstract: 1