CHARGED-PARTICLE-BEAM BASED FABRICATION METHOD FOR MICRO- AND NANO-STRUCTURES AND OPTICAL DEVICES FABRICATED BY THE METHOD

摘要

The present invention relates to a charged-particle-beam based, direct-write fabrication method for high-quality micro- and nano-structures and to devices, in particular optical devices, fabricated by use of said method. The fabricated micro- and nano-structures are of high-quality in terms of surface roughness, minimal feature size and the sharpness of edges, corners etc. The method comprises a step (S3) of determining a plurality of sub-areas that sum up to a continuous area to be exposed, wherein a dimension of a first kind of sub-areas (5) of the plurality of sub-areas is smaller than a related dimension of a second kind of sub-areas (6) of the plurality of sub-areas, a step (S4) of providing an exposure protocol being configured to control a charged-particle-beam facility in a manner that the plurality of sub-areas is exposed, and a step (S5) of exposing a surface of a layered structure by use of the exposure protocol.