Photosensitive transfer material, manufacturing method of resin pattern, method of manufacturing circuit wiring, manufacturing method of touch panel, and film and its manufacturing method

摘要

The photosensitive transfer material has a temporary support and a photosensitive resin layer provided on the temporary support, wherein the temporary support comprises a particle containing layer containing particles, and the surface roughness of the surface of the temporary support body opposite the side of the side having the photosensitive resin layer is 0.02 μ M μ The photosensitive resin layer contains a polymer containing a constituent unit having an acid group protected by an acid degradable group and a photo acid generator.Manufacturing method of resin pattern using the transfer material, manufacturing method of circuit wiring, manufacturing method of the touch panel, and having the particle containing layer, the Hayes value is 0.2% or less, and the surface roughness Ra of the side having the particle containing layer is 0.02 μ M μ A film and a manufacturing method thereof are also provided.