The present invention relates to a method for coating a metal strip (10) with a metal substrate (12) in a strip coating system (1), the coating being carried out according to the principle of physical vapor deposition (PVD), the layer thickness is set via the parameters of strip speed and evaporation rate. According to the invention, when changing the layer thickness and/or the width of the metal strip 10, the evaporation rate and the strip speed are also changed simultaneously, whereby the layer thickness change can be implemented directly independently of the thermal evaporation process. .
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