首页> 外国专利> METHOD FOR CREATING ANTI-DIFFUSION BARRIER ON SURFACE OF PLATES MADE OF THERMOELECTRIC MATERIALS BASED ON BISMUTH AND ANTIMONY CHALCOGENIDES

METHOD FOR CREATING ANTI-DIFFUSION BARRIER ON SURFACE OF PLATES MADE OF THERMOELECTRIC MATERIALS BASED ON BISMUTH AND ANTIMONY CHALCOGENIDES

机译:基于铋和锑硫胺化物的热电材料制成的抗扩散屏障在板上产生抗扩散屏障

摘要

FIELD: thermoelectric instruments. ;SUBSTANCE: invention relates to thermoelectric instrumentation and can be used for chemical processing of plates before electrochemical deposition of metal coatings on the surface of plates made of thermoelectric materials. The achievement of the expected result is ensured due to the fact that the “Method for creating an anti-diffusion barrier on the surface of plates made of thermoelectric materials based on bismuth and antimony chalcogenides” includes chemical treatment of plates with solutions containing nitric and hydrochloric acids and electrochemical nickel plating of the surface of the plates. In this case, the chemical treatment is carried out in three stages: at the first stage, the chemical treatment of the plates is carried out in a solution of sodium hydroxide with a concentration of 10, wt. %. At the second stage, the chemical treatment of the plates is carried out at a temperature of 20-30°C by aqueous solutions of hydrochloric and nitric acids for one minute. And the third stage is also carried out with aqueous acid solutions at a temperature of 20-30°C for one minute, then electrochemical nickel plating is carried out in an electrolyte for nickel plating. In addition, the first stage of chemical treatment of plates is carried out in an ultrasonic bath with an ultrasound power equal to 60 W/cm2 at a temperature of 45°C for 5 minutes. And at the second stage, chemical treatment of plates with acid solutions is carried out at a volume ratio: water : hydrochloric acid : nitric acid, equal to 18:1:1, respectively, followed by washing in distilled water at a temperature of 18-20°C for one minute. Finally, the third stage of chemical treatment of the plates is carried out with solutions of hydrofluoric and nitric acids at a volume ratio: water : hydrofluoric acid : nitric acid, equal to 38:1:1, respectively, followed by washing in distilled water at a temperature of 18-20°C for 1 min. Then electrochemical nickel plating of plates made of thermoelectric material is carried out in an electrolysis bath with an electrolyte containing hydrochloric acid and nickel chloride in a volume ratio equal to 1:2.5 at a cathode current density of 0.4 A/dm2 for 5 minutes to obtain a nickel layer thickness of 10-15 mcm. ;EFFECT: increase in the adhesive properties of the surface layer of plates made of thermoelectric materials by creating an anti-diffusion barrier on it by chemical treatment of plates made of thermoelectric materials with ultrasound and step-by-step by solutions of various acids with an optimally matched ratio between them.;1 cl
机译:现场:热电仪器。 ;物质:发明涉及热电仪器,可用于在电化学沉积的电化学沉积在由热电材料制成的板上的电化学沉积之前。由于“在基于铋和锑化合物的热电材料制成的板表面上产生抗扩散屏障的方法”包括含有硝酸溶液的溶液的溶液的化学处理,因此确保了预期结果的实现。酸和板表面的电化学镀镍。在这种情况下,化学处理在三个阶段进行:在第一阶段,在氢氧化钠的溶液中进行平板的化学处理,浓度为10,重量%。 %。在第二阶段,通过盐酸和硝酸的水溶液,将板的化学处理在20-30℃的温度下进行一分钟。并且第三阶段也用酸溶液在20-30℃的温度下进行1分钟,然后在镍镀的电解质中进行电化学镍镀。另外,板材的化学处理的第一阶段在超声波浴中进行,在45℃的温度下,超声波功率等于60W / cm 2,保持5分钟。并且在第二阶段,用酸溶液的平板化学处理以体积比进行:水:盐酸:硝酸,分别等于18:1:1,然后在18的温度下洗涤蒸馏水。 -20°C一分钟。最后,平板的化学处理的第三阶段是用体积比的氢氟和硝酸的溶液进行:水:氢氟酸分别,硝酸,等于38:1:1,然后在蒸馏水中洗涤在18-20℃的温度下1分钟。然后在电解浴中镀在电解浴中进行电化学镀镍,在具有盐酸的电解质和体积比的电解质,在阴极电流密度为0.4a / dm2的阴极电流密度5分钟以获得5分钟镍层厚度为10-15 mcm。效果:通过通过各种酸的超声和逐步产生的电气材料的化学处理,通过在各种酸的溶液中产生由热电材料制成的抗扩散屏障来增加由热电材料制成的电极表面层的粘合性能。它们之间的最佳匹配比率。; 1 cl

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