ELECTRIC FIELD SHAPING APPARATUS AND TARGET PROCESSING DEVICE USING ELECTRIC FIELD

摘要

The electric field shaping apparatus according to the present embodiment includes a substrate, a first electrode positioned on the substrate, a second electrode spaced apart from the first electrode, and a power source for providing a voltage to the first electrode and the second electrode and an insulating material coating the first electrode, wherein the insulator is formed with one or more holes that shape an electric field formed between the first electrode and the second electrode.