Defect inspection method for phase shift mask and defect inspection apparatus for same

摘要

Preparing an EUV mask including a multilayer thin film mirror and a phase shift mask on the multilayer thin film mirror, disposing a phase shift thin film on the EUV mask, a light source unit said irradiating a phase shift thin film and a first extreme ultraviolet (EUV) light to the EUV mask, collecting the second EUV light reflected from the EUV mask by a detector, and a determination unit including the first EUV light and the second EUV light Comparing the intensity of EUV light, there may be provided a method for inspecting whether a phase shift mask is good or bad, including determining a phase defect in the phase shift mask.