首页> 外国专利> TWO-PHOTON FLUORESCENCE MICROSCOPY AT EXTREMELY LOW EXCITATION INTENSITY

TWO-PHOTON FLUORESCENCE MICROSCOPY AT EXTREMELY LOW EXCITATION INTENSITY

机译:两个光子荧光显微镜极低激发强度

摘要

The present disclosure pertains to two-photon microscopy, and specifically to methods and systems for optimizing the performance of entangled two-photon absorption (ETPA) microscopy. An ETPA microscope is described with time delay tunability to optimize the coincidence of entangled photons on a sample. The optimization allows for increased two-photon absorption by the sample, resulting in increased luminescence of the sample. The ETPA microscopy systems and methods described allow for nonlinear imaging using excitation energy intensities six orders of magnitude lower than comparable two-photon absorption microscopy techniques using classical light.
机译:本公开涉及双光子显微镜,并且具体地涉及用于优化缠结的双光子吸收(ETPA)显微镜的性能的方法和系统。 描述了ETPA显微镜,随着时间延迟可调性描述,以优化缠结光子在样品上的巧合。 优化允许通过样品增加两光子吸收,导致样品的发光增加。 所描述的ETPA显微镜系统和方法允许使用激励能量强度的非线性成像六个数量级低于使用经典光的类似双光子吸收显微镜技术。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号