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Hafnium carbide powder for plasma electrodes, its manufacturing method, hafnium carbide sintered body and plasma electrode
Hafnium carbide powder for plasma electrodes, its manufacturing method, hafnium carbide sintered body and plasma electrode
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机译:用于等离子体电极的碳化铪粉,其制造方法,碳化铪烧结体和等离子体电极
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摘要
To provide a hafnium carbide powder for plasma electrode capable of suppressing contamination of carbon particles as impurities and improving quality of the hafnium carbide powder, a manufacturing method therefor, a hafnium carbide sintered body and a plasma electrode.SOLUTION: A hafnium carbide powder for plasma electrode is a powder of hafnium carbide represented by a chemical formula HfC, wherein x=0.5 to 1.0, and having content of carbon particles as impurities of 0.03 mass% or less. Average particle diameter of the hafnium carbide powder is preferably 0.5 to 2 μm. When the hafnium carbide powder is manufactured, for example, a pellet 16 of hafnium oxide and a mixed powder of carbon is housed in a silicon carbide made second crucible 17, the second crucible 17 is arranged in a first crucible 12 and a heating reaction is conducted at 1800 to 2000°C and the hafnium carbide powder can be generated.SELECTED DRAWING: Figure 1
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