A chemically amplified positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method for producing a molded substrate, and a method for producing a plated article

摘要

A photosensitive dry film, a photosensitive dry film comprising: a chemically amplified positive photosensitive resin composition applicable to exposure with h line and excellent in plating solution resistance and crack resistance; and a photosensitive resin layer comprising a chemically amplified positive photosensitive resin composition; A method for manufacturing a patterned resist film using a chemically amplified positive photosensitive resin composition, a method for manufacturing a substrate with a mold using a chemically amplified positive photosensitive resin composition, and a substrate with a mold Provided is a method for manufacturing a plating object to be used. Chemically amplified positive containing an acid generator (A) and a resin (B) whose solubility in alkali is increased by the action of an acid and an acid generator (A) As a photosensitive resin composition, the acid generator (A) contains the acid generator which has a specific naphthalimide skeleton, and the ratio of the acrylic resin with respect to the sum total of resin other than resin (B) and resin (B) is 70 mass % or more.