CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING PLATED MODELED OBJECT

摘要

Provided are: a chemically amplified positive photosensitive resin composition that readily forms a resist pattern having a rectangular cross-sectional shape, the composition having excellent sensitivity and being capable of suppressing the decomposition of an acid generator; a photosensitive dry film equipped with a photosensitive layer composed of the chemically amplified positive photosensitive resin composition, and a method for producing the photosensitive dry film; a method for producing a patterned resist film using a chemically amplified positive photosensitive resin composition; a method for producing a substrate provided with a template; and a method for producing a plated modeled object.　A chemically amplified positive photosensitive resin composition containing an acid generator (A) that generates an acid upon irradiation with activated rays or radiation, a resin (B) the solubility of which in alkali increases due to the action of acid, and an acid diffusion inhibitor (C), wherein the acid generator (A) includes a non-ionic acid generator that generates sulfonic acid upon irradiation with activated rays or radiation, and the acid diffusion inhibitor (C) includes a compound having a specific structure that is decomposed by activated rays or radiation.