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Filter for refining plating liquid and adsorbent for purification of plating liquid

机译:用于精炼电镀液和吸附剂的过滤器,用于净化电镀液

摘要

Problem to be solved: to provide an activated carbon containing filter for purifying the plating solution capable of efficiently removing the decomposition product produced from the additive.A filter for purifying plating liquid according to one aspect of the present invention isContains an adsorbent consisting of activated carbonA molded body 6 having an iodine adsorption amount per unit mass of 930 to 1300 mg / G is providedChloride ion concentration is 6.0 to 9.0 mg / LPH 6.9 to 7.5Electrical conductivity is μ The concentration of chloride ion of filtered water after filtration of raw water, which is s / cm, was filtered for 1 minuteIt is less than the chloride ion concentration of the raw water.Diagram
机译:要解决的问题:提供一种含有活性炭的滤光器,用于纯化能够有效地除去由添加剂制备的分解产物的电镀液。根据本发明的一个方面的用于净化电镀液的过滤器是由活性炭组成的吸附剂。 具有930至1300mg / g的碘吸附量为930-1300mg / g的模制体6是离子浓度为6.0至9.0mg / LPH 6.9至7.5至7.5至7.5电导率为μ滤水后过滤后水的氯离子浓度, 过滤了S / cm,过滤1分钟小于氯化物离子浓度的原水.Diagram

著录项

  • 公开/公告号JP2021176634A

    专利类型

  • 公开/公告日2021-11-11

    原文格式PDF

  • 申请/专利权人 株式会社クラレ;

    申请/专利号JP20210112350

  • 发明设计人 花本 哲也;吉延 寛枝;

    申请日2021-07-06

  • 分类号C02F1/28;B01J20/20;B01J20/28;C01B32/336;C01B32/354;

  • 国家 JP

  • 入库时间 2022-08-24 22:12:49

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