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Plasma irradiation system and plasma irradiation method

机译:等离子照射系统和等离子体照射法

摘要

The practicality of plasma irradiation system is improved.A plasma irradiation system 10 for irradiating a plasma to an object to be processed;Plasma irradiation systemA feeder that supplies a substrate whose optical properties change due to plasma irradiationThe base material fed by the feederAn imparting device 12 to be applied to an object to be processed andBase material to be treated andA plasma irradiating apparatus 14 for irradiating a plasma with an object to be treatedA plasma irradiation system comprising measuring apparatus 16 for measuring optical properties of a substrate irradiated by plasma by means of a plasma irradiation apparatus.Diagram
机译:等离子体照射系统的实用性得到改善。等离子体照射系统10,用于照射等离子体以将待加工的物体照射;等离子体照射系统供给器,其供应由等离子体照射引起的光学性质变化的基材,该等离子体照射由饲喂器赋予装置12供给的基材。 要应用于待处理的物体和比等离子体照射装置14的物体,用于照射具有物体的等离子体的等离子体照射装置14,该等离子体照射系统包括用于测量由等离子体照射的基板的光学性质的测量装置16 等离子体照射装置.Diagram.

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