RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN USING SAME, AND SULFONIC ACID SALT COMPOUND AND RADIATION-SENSITIVE ACID GENERATOR COMPRISING SAME

摘要

Provided are a method for forming a resist pattern and a radiation-sensitive resin composition which, even when a next-generation exposure technology is applied thereto, have excellent performances concerning sensitivity during exposure steps, LWR performance, etc.　The radiation-sensitive resin composition comprises a sulfonic acid salt compound represented by formula (1), a resin including a structural unit having an acid-dissociable group, and a solvent.　(In the formula, the Rf moieties are each independently a hydrogen atom, a fluorine atom, a fluoroalkyl group, etc.)