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DIFFRACTION DEVICE AND METHOD FOR NON-DESTRUCTIVE TESTING OF INTERNAL CRYSTAL ORIENTATION UNIFORMITY OF WORKPIECE

机译:工件内晶体取向均匀性的非破坏性测试的衍射装置和方法

摘要

A diffraction device and a method for non-destructive testing of internal crystal orientation uniformity of a workpiece. The diffraction device comprises: an X-ray irradiation system used for irradiating X-ray to a measuring part of a measured sample (4); an X-ray detection system used for detecting a plurality of diffraction X-rays formed by diffracting the X-ray with a plurality of parts of the measured sample (4), to measure X-ray diffraction intensity distribution of the measured sample (4). The detected X-ray is short-wavelength feature X-ray, and the X-ray detection system is an array detection system (5). The method comprises steps of selecting the short-wavelength feature X-ray, performing texture analysis on the measured sample (4), and determining a diffraction vector Q to be measured; and obtaining the X-ray diffraction intensity of the corresponding part of the measured sample (4). The method can rapidly and non-destructively test the internal crystal orientation uniformity of a centimeter-thick workpiece in its entire thickness direction, and implement online testing and characterization of the internal crystal orientation uniformity of the centimeter-thick workpiece in the entire thickness direction of its movement trajectory.
机译:衍射装置和用于工件内晶体取向均匀性的非破坏性测试的方法。衍射装置包括:X射线照射系统,用于照射X射线到测量样品(4)的测量部分;一种X射线检测系统,用于检测通过衍射通过测量样品(4)的多个部分的X射线形成的多个衍射X射线,以测量测量样品的X射线衍射强度分布(4 )。检测到的X射线是短波长特征X射线,X射线检测系统是阵列检测系统(5)。该方法包括选择短波长特征X射线的步骤,对测量的样品(4)进行纹理分析,并确定要测量的衍射矢量Q;并获得测量样品的相应部分的X射线衍射强度(4)。该方法可以在其整个厚度方向上快速且不破坏性地测试厘米厚的工件的内部晶体取向均匀性,并在整个厚度方向上实现厘米厚工件的内晶方向均匀性的在线测试和表征它的运动轨迹。

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