首页> 外国专利> A structure in which monoatoms are dispersed on a support, a method for producing a structure having a single atom dispersed on a support and sputtering apparatus

A structure in which monoatoms are dispersed on a support, a method for producing a structure having a single atom dispersed on a support and sputtering apparatus

机译:其中MONOATOMS在支撑件上分散的结构,一种制造具有分散在支撑件和溅射装置上的单个原子的结构的方法

摘要

The present invention relates to a structure in which single atoms are dispersed on a support. The structure comprises: a support on which an anchor site capable of adsorbing atoms which can be used in sputtering is formed; and the atoms which can be used in sputtering and which are adsorbed by the anchor site and dispersed as single atoms on the support. The structure enables atoms of more varied types to be dispersed as single atoms.
机译:本发明涉及一种结构,其中单个原子分散在载体上。 该结构包括:形成能够在其上形成能够在溅射中使用的吸附原子的锚固位点; 和可用于溅射的原子并且被锚固位点吸附并作为单个原子在载体上分散。 该结构使得更多种类型的原子能够分散为单个原子。

著录项

  • 公开/公告号JP6957022B2

    专利类型

  • 公开/公告日2021-11-02

    原文格式PDF

  • 申请/专利权人 国立大学法人北海道大学;

    申请/专利号JP20170565507

  • 发明设计人 郷原 一壽;前原 洋祐;山崎 憲慈;

    申请日2017-01-26

  • 分类号B01J35/02;B01J37/02;B01J37/34;B01J23/42;B01J23/46;B01J23/52;C01B32/186;C01B32/194;C01B32/184;C23C14/14;C23C14/34;C23C16/26;B82Y30;B82Y40;

  • 国家 JP

  • 入库时间 2022-08-24 22:03:04

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