首页> 外国专利> STRUCTURE IN WHICH SINGLE ATOMS ARE DISPERSED ON SUPPORT, METHOD FOR MANUFACTURING STRUCTURE IN WHICH SINGLE ATOMS ARE DISPERSED ON SUPPORT, AND SPUTTERING DEVICE

STRUCTURE IN WHICH SINGLE ATOMS ARE DISPERSED ON SUPPORT, METHOD FOR MANUFACTURING STRUCTURE IN WHICH SINGLE ATOMS ARE DISPERSED ON SUPPORT, AND SPUTTERING DEVICE

机译:在单个原子上分散支撑的结构,在单个原子上分散支撑的结构的方法以及溅射装置

摘要

The present invention relates to a structure in which single atoms are dispersed on a support. The structure comprises: a support on which an anchor site capable of adsorbing atoms which can be used in sputtering is formed; and the atoms which can be used in sputtering and which are adsorbed by the anchor site and dispersed as single atoms on the support. The structure enables atoms of more varied types to be dispersed as single atoms.
机译:本发明涉及其中单个原子分散在载体上的结构。该结构包括:支撑体,在其上形成能够吸附可用于溅射的原子的锚定位点;以及可用于溅射的原子被锚定位点吸附并作为单个原子分散在载体上。该结构使更多种类型的原子能够分散为单个原子。

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