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Electronic Discharge Device and Split Multi Rail Network with Symmetrical Layout Design Technique

机译:具有对称布局设计技术的电子放电装置和分体式多轨网络

摘要

A symmetrical layout technique for an electrostatic discharge ESD device and a corresponding power supply network is presented. The ESD device protects an electronic circuit against an overvoltage or overcurrent and contains a first contact area to establish an electrical contact with a first supply rail, a second contact area to establish an electrical contact with a second supply rail, and a third contact area to establish an electrical contact with a third supply rail. The first and third supply rails provide a first supply voltage, and the second supply rail provides a second supply voltage. Within the ESD device, an axis of symmetry passes through the second contact area, and the first contact area and the third contact area are arranged on opposite sides with regard to the axis of symmetry. The symmetrical layout technique allows flipping the orientation of the ESD device with regard to the supply rails.
机译:介绍了静电放电ESD装置的对称布局技术和相应的电源网络。 ESD设备保护电子电路抵靠过电压或过电流,并包含第一接触区域,以与第一供应轨确定电接触,第二接触区域,以与第二电源轨和第三接触区域建立电接触区域和第三接触区域 建立与第三种电源轨的电接触。 第一和第三电源轨提供第一电源电压,第二电源轨提供第二电源电压。 在ESD装置内,对称轴通过第二接触面积,并且第一接触面积和第三接触面积布置在相对的侧面上,关于对称轴线。 对称布局技术允许将ESD装置的方向翻转到供应轨。

著录项

  • 公开/公告号US2021313315A1

    专利类型

  • 公开/公告日2021-10-07

    原文格式PDF

  • 申请/专利权人 DIALOG SEMICONDUCTOR (UK) LIMITED;

    申请/专利号US202117350044

  • 发明设计人 MARCUS PEITZ;

    申请日2021-06-17

  • 分类号H01L27/02;

  • 国家 US

  • 入库时间 2022-08-24 21:29:57

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