首页> 外国专利> POWER SEMICONDUCTOR DEVICE WITH TRENCHGATE STRUCTURES WITH LONGITUDINAL AXES INCLINED TO A MAIN CRYSTAL DIRECTION AND MANUFACTURING PROCESS

POWER SEMICONDUCTOR DEVICE WITH TRENCHGATE STRUCTURES WITH LONGITUDINAL AXES INCLINED TO A MAIN CRYSTAL DIRECTION AND MANUFACTURING PROCESS

机译:具有带钻石结构的功率半导体器件,纵向轴倾斜到主晶体方向和制造工艺

摘要

A semiconductor device, comprising: a semiconductor body (100) with a first main crystal direction (401) parallel to a horizontal plane, trench gate structures (150) with a longitudinal extension greater than a width in the horizontal plane, with longitudinal axes (159) of the trench gate structures (150) the first main crystal direction (401) are inclined by an inclination angle (φ) of at least 2 degrees and at most 30 degrees in the horizontal plane, and mesa parts (170) between adjacent trench gate structures (150), first side wall sections (104a) of first mesa side walls (104) Main crystal planes are parallel to the first main crystal direction (401) and second side wall sections (104b), which are inclined to the first side wall sections (104a), connect the first side wall sections (104a).
机译:半导体器件,包括:半导体本体(100),其具有平行于水平面的第一主晶体方向(401),沟槽栅极结构(150),纵向延伸部大于水平平面中的宽度,具有纵向轴( 沟槽栅极结构(150)的159)第一主晶体方向(401)通过至少2度的倾斜角(φ)倾斜,并且在水平平面中至多30度,并且在相邻之间的台部(170) 沟槽栅极结构(150),第一台侧壁(104)主晶平面的第一侧壁部分(104a)平行于第一主晶体方向(401)和第二侧壁部分(104b),其倾斜于 第一侧壁部分(104a),连接第一侧壁部分(104a)。

著录项

  • 公开/公告号DE102015103070B4

    专利类型

  • 公开/公告日2021-09-23

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE201510103070

  • 发明设计人 ROLAND RUPP;ROMAIN ESTEVE;DETHARD PETERS;

    申请日2015-03-03

  • 分类号H01L29/04;H01L29/78;H01L29/739;H01L29/423;

  • 国家 DE

  • 入库时间 2022-08-24 21:13:45

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