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Measurement apparatus and method for predicting aberrations in a projection system
Measurement apparatus and method for predicting aberrations in a projection system
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机译:用于预测投影系统中的像差的测量装置和方法
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摘要
A method of calibrating a projection system heating model to predict an aberration in a projection system in a lithographic apparatus, the method comprising passing exposure radiation through a projection system to expose one or more exposure fields on a substrate provided on a substrate table, making measurements of the aberration in the projection system caused by the exposure radiation, wherein the time period between measurements is less than the time period that would be taken to expose all exposure fields on the substrate.
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