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SUBSTRATE PROCESSING DEVICE, JIG, CALIBRATION METHOD FOR SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
SUBSTRATE PROCESSING DEVICE, JIG, CALIBRATION METHOD FOR SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
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机译:基板处理装置,夹具,衬底处理装置的校准方法,以及制造半导体器件的方法
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摘要
Provided is an invention that has: a processing container in which a substrate is processed; a port that, inside the processing container, forms an opening through which a temperature-measuring instrument having a protective tube is inserted facing upward; and a non-metal jig that covers the inner surface of the opening of the port, and is formed in a cylindrical shape that can be mounted in the port from inside the processing container. The jig inserted in the port is configured to be able to move up and down together with the temperature-measuring instrument when the temperature-measuring instrument is mounted in the port.
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