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Substrate shape, geometry, positioning, and/or cell density to improve aftertreatment performance
Substrate shape, geometry, positioning, and/or cell density to improve aftertreatment performance
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机译:基板形状,几何,定位和/或细胞密度,以改善后处理性能
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摘要
An aftertreatment component's shape, entrance geometry, and/or position within an aftertreatment assembly can be modified for local and/or bulk exhaust flow control. In some implementations, a body of the aftertreatment component has a non-circular cross-section, a non-circular opening, and/or a variable face geometry. The non-circular cross-section and/or opening can be of a variety of different shapes.
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