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EXTREME ULTRAVIOLET MASK BLANK SYSTEM AND OPTICAL TRAIN FOR EUV LITHOGRAPHY SYSTEM
EXTREME ULTRAVIOLET MASK BLANK SYSTEM AND OPTICAL TRAIN FOR EUV LITHOGRAPHY SYSTEM
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机译:EUV光刻系统的极端紫外掩模空白系统和光学火车
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摘要
An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.
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