Fabrication of photonic signal transmission region with photonic structure

摘要

A method of depositing a layer formed of a barrier material on a conductive material formation of a photonic structure and removing a material of a layer in an optical signal transmission region of a photonic structure is described herein. In one embodiment, the barrier material may include silicon carbonitride. In one embodiment, the barrier material may comprise silicon nitride.Fig. 3 (a)