Sample Well Fabrication Techniques and Structures for Integrated Sensor Devices

摘要

A method of forming an integrated device comprises: forming a sample well in a cladding layer of a substrate; forming a sacrificial spacer layer over the substrate and into the sample well; performing a directional etch of the sacrificial spacer layer to form a sacrificial sidewall spacer on sidewalls of the sample well; forming a functional layer over the substrate and into the sample well that provides a site for attachment of the biomolecule; and removing the sacrificial spacer material.