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Method and apparatus for fabrication of large area 3D photonic crystals with embedded waveguides
Method and apparatus for fabrication of large area 3D photonic crystals with embedded waveguides
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机译:用嵌入式波导制造大面积3D光子晶体的方法和装置
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摘要
In accordance with some aspects of the present disclosure, a maskless interferometric lithography system for fabricating a three-dimensional (3D) photonic crystal using a multiple two-beam-exposures is disclosed. The system can comprise an illumination system comprising an optical arrangement operable to receive radiation from a radiation source and provide three or more tilted two-beam interference pattern exposures to be combined into a three-dimensional pattern; and a substrate operable to be supported by a substrate table, wherein the substrate comprises a photoresist formed on a top surface of the substrate and operable to receive the three-dimensional pattern and wherein means are provided to adjust the position of the substrate in all six mechanical degrees of freedom.
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