DEVICE AND METHOD FOR COATING CHANNELS OF A SAMPLE BY MEANS OF VAPOR DEPOSITION

摘要

The invention relates to a device and a method for coating channels by means of vapor deposition, wherein gaseous precursors are supplied to the channels via at least one supply line connected to first channel ends of the channels and are discharged from the channels together with reaction products via a first discharge line connected to second channel ends lying opposite the first channel ends. The invention is characterized in that at least two different precursors are supplied to the first channel end in an alternating manner via the at least one supply line; while supplying the precursors, a precursor flow is conducted along a first flow direction from the supply line to the first discharge line through the channels by generating an adjustable pressure gradient; and non-reacted precursors and reaction products are discharged via a second discharge line connected to the first channel end.